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Karl Rönnby

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8

Predicting the Morphology of Cobalt, Copper, and Ruthenium on TaN for Interconnect Metal Deposition

24 December 2024 by Karl Rönnby and Michael Nolan

Theoretical and Computational Chemistry, Inorganic Chemistry

On the differences in trimethylaluminum infiltration into PMMA and PLA polymers for sequential infiltration synthesis: insights from experiment and first principles simulations

4 November 2024 by Michele Perego and others

Physical Chemistry, Inorganic Chemistry

Thermal Decomposition of Trimethylindium and Indium Trisguanidinate Precursors for InN Growth: An Ab-Initio and Kinetic Modelling Study

28 February 2023 by Giane Damas and others

Materials Science, Physical Chemistry

On the limitations of thermal atomic layer deposition of InN using ammonia

6 December 2022 by Karl Rönnby and others at

Linköping University

Materials Science, Theoretical and Computational Chemistry

Surface structures from NH3 chemisorption in CVD and ALD of AlN, GaN and InN films

24 January 2022 by Karl Rönnby and others at

Linköping University

Physical Chemistry, Materials Chemistry

Hexacoordinated Gallium(III) Triazenide Precursor for Epitaxial Gallium Nitride by Atomic Layer Deposition

5 November 2020 by Polla Rouf and others at

Linköping University

Main Group Chemistry, Materials Chemistry

Kinetic Modeling of Ammonia Decomposition at CVD Conditions

3 June 2020 by Karl Rönnby and others at

Linkoping University

Main Group Chemistry, Chemical Kinetics

In-situ Activation of a Highly Volatile and Thermally Stable Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition

28 November 2019 by Nathan O'Brien and others at

Linkoping University

Main Group Chemistry, Ligands

The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling ALD of InN Films

19 June 2019 by Polla Rouf and others at

Linköping University

Computational Chemistry and Modeling, Ligands

Methylamines as Nitrogen Precursors in Chemical Vapor Deposition of Gallium Nitride

21 January 2019 by Karl Rönnby and others at

Linköping University

Main Group Chemistry, Computational Chemistry and Modeling

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Main Group Chemistry Surface Thin Films Ligands Physical Chemistry Materials Processing Interfaces Thermodynamics Organometallic Compounds Ligand Design Materials Science Theoretical and Computational Chemistry Materials Chemistry Physical and Chemical Processes Coordination Chemistry