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Arun Haridas Choolakkal
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1
Using a heavy inert diffusion additive for superconformal atomic layer deposition
13 December 2024 by
Arun Haridas Choolakkal
and
others
at
Linköping University
Physical Chemistry
,
Materials Science
Competitive co-diffusion as a route to enhanced step coverage in chemical vapor deposition
5 September 2024 by
Arun Haridas Choolakkal
and
others
at
Linköping University
Physical Chemistry
,
Materials Science
Competitive co-diffusion as a route to enhanced step coverage in chemical vapor deposition
20 June 2024 by
Arun Haridas Choolakkal
and
others
at
Linköping University
Physical Chemistry
,
Materials Science
Competitive co-diffusion as a route to enhanced step coverage in chemical vapor deposition
24 January 2024 by
Arun Haridas Choolakkal
and
others
at
Linköping University
Physical Chemistry
,
Materials Science
This is an AI-generated summary
Key points
Topics
Physical Chemistry
Materials Science
Materials Processing
Thin Films
Transport Phenomena
Materials Chemistry
