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Physical mechanisms affecting critical angle for nanopatterning in irradiated thin films: I. A composite model

By Tyler Evans and Scott Norris
Ion-beam irradiation of an amorphizable material such as Si or Ge may lead to spontaneous pattern formation, rather than flat surfaces, for irradiation beyond some critical angle against the surface normal. It is observed experimentally that this critical angle varies according to many factors, including beam energy, ion species and... Show more
October 29, 2022
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Physical mechanisms affecting critical angle for nanopatterning in irradiated thin films: I. A composite model
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